Abstract:
In this article, we study Metal–Oxide–Semiconductor Field-Effect Transistor (MOSFET) and
Junction Field-Effect Transistor (JFET). The fundamental physics and characteristics of
MOSFET and JFET have been considered. In Chapter 1, we discussed MOSFET structure,
energy band diagram with p-type and n-type substrate, threshold voltage, Origin of Subthreshold
CMOS Design and Capacitance-Voltage Characteristics. Both the N-channel and p-channel
MOSFET with enhancement mode and depletion mode were described. We have considered the
ideal C–V characteristics of the MOS capacitor and deviations that occur from these idealized
results in practical situations. There are three operating conditions of interest in the MOS
capacitor: accumulation, depletion, and inversion.Subthreshold region is defined as when the
supply voltage is less than the device threshold voltage. The energy saving and operation of the
subthreshold circuit is demonstrated, and its advantages are discussed here. In chapter 2, we
discussed JFET characteristics, the transconductance model, JFET as switch, JFET channel
pinched-off, N-channel, and p-channel JFET, biasing of JFET, operation of JFET, ideal dc
current-voltage relationship—depletion mode JFET, velocity saturation effects, subthreshold,
and gate current effects. This three-terminal semiconductor device can be electronically used as
controlled switches, amplifiers, or voltage-controlled resistors. The JFET may wear out if the
gate is positively biased. Three non-ideal effects, such as channel-length modulation, velocity
saturation, and subthreshold current are considered. Each of these effects changes the ideal
current-voltage relationship.
Description:
The metal-oxide-semiconductor field-impact transistor (MOSFET) is the most-significant gadget
for front line high-thickness coordinated circuits, for example, microprocessors and
semiconductor recollections. It is additionally turning into a significant power gadget. The
gadget has three terminals comprising of a source, gate and drain.Theprin-ciple of the surface
field-impact transistor was first proposed in the mid 1930s by Lilienfeld and HeiL.[2] The
single-crossing point semiconductor contraptions that we have considered, including the pn
homojunction diode, can be used to make changing current–voltage attributes and to outline
electronic trading circuits. The transistor is a multijunction semiconductor device that, identified
with other circuit segments, is prepared for current increment, voltage expansion, and sign power
gain. The Metal–Oxide–Semiconductor Field-Effect Transistor (MOSFET) is one of two
noteworthy sorts of transistors. [1]The major material science of the MOSFET is created in this
section. Two integral configurations of MOS transistors, the n-channel MOSFET and the p-
channel MOSFET, can be created. Electronic circuit configuration turns out to be exceptionally
flexible when the two kinds of gadgets are utilized in a similar circuit. These circuits are alluded
to as correlative MOS (CMOS) circuits.