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TECHNIQUES TO IMPROVE THE MAGNETORESISTANCE SENSITIVITY OF InSb THIN FILMS

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dc.date.accessioned 2012-11-07T09:33:47Z
dc.date.accessioned 2019-05-28T09:31:08Z
dc.date.available 2012-11-07T09:33:47Z
dc.date.available 2019-05-28T09:31:08Z
dc.date.issued 2006-07-01
dc.identifier.uri http://hdl.handle.net/20.500.11948/441
dc.description.abstract Thin films of indium antimonide (InSb) were deposited onto a well cleaned glass substrate by vacuum evaporation technique using InSb compound as a source material. The galvanomagnetic properties such as Hall voltage, Hall mobility and magnetoresistance sensitivity of the prepared films were investigated in terms of annealing temperature. All the measurements were taken at room temperature under the magnetic field from 0.1 T to 1.0 T. It is observed that the magnetoresistance sensitivity increases with the decrease of length to width ratio of the specimen. The magnetoresistance sensitivity of 85% was obtained for the film with the length to width ratio of 0.8, annealed at a temperature of 470oC for 60 min. For further improvement of the sensitivity of the film, indium (In) short-bar electrodes were deposited on InSb film and a maximum sensitivity of 105% was successfully achieved for the length to width ratio of 0.2 and magnetic field of 1.0 T. en_US
dc.language.iso en en_US
dc.publisher Daffodil International University en_US
dc.subject Galvanomagnetic properties, Hall mobility Indium antimonide (InSb), indium (In) shortbar electrode. en_US
dc.title TECHNIQUES TO IMPROVE THE MAGNETORESISTANCE SENSITIVITY OF InSb THIN FILMS en_US
dc.type Article en_US


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